Upcoming Events
1st HaloFreeEtch Webinar: “Plasma Etching Explained: The Revolution in Micro and Nanoengineering”
06.06.2025 (Friday)
, 11:00 - 12:30
online
With the EU-funded project HaloFreeEtch, a new era in micro- and nanoengineering is unfolding — aiming to establish sustainable, halogen-free etching processes for the semiconductor industry. Join us to explore the future of plasma etching technology! We are pleased to invite you to the 1st HaloFreeEtch Webinar entitled: “Plasma Etching Explained: The Revolution in Micro and Nanoengineering”
📅 Date: Friday, June 6th, 2025
🕙 Time: 11:00 – 12:30 CEST
📍 Join via Microsoft Teams: Click here to join the webinar
🌐 More details here: HaloFreeEtch 1st Webinar
In this first session of our webinar series, three expert talks will guide you through the evolving landscape of plasma etching: from a foundational introduction to the technology, to a focus on the BOSCH process—an innovation that reshaped the field in 1994—and a look at groundbreaking applications that would not be possible without deep etching.
- Plasma Etching: A key technique for micro and nano patterning in chip manufacturing | Micha Haase, Fraunhofer ENAS
- The BOSCH process for deep reactive etching – how it pioneered high aspect ration etching for applications in everyday live | Andrea Urban, Robert Bosch GmbH
- Applications enabled by high aspect ratio etching | Wim De Malsche, MICROLAB (Vrije Universiteit Brussel)
At the end there will be time for a Q&A Session.
Further information is given by Dr. Jörg Schuster from Chemnitz university of Technology, coordinator of HaloFreeEtch (joerg.schuster@zfm.tu.-chemnitz.de).