Novel High k Application Workshop 2016
14.03.2016 (Monday) - 15.03.2016 (Tuesday)
, 09:00 - 18:00
Technical University of Dresden - Goerges lecture hall , Helmholtz Strasse 9 , 01069 Dresden
In collaboration with the EU COST networking project HerALD (working group 4), NaMLab invites to the Novel High-k Application Workshop on March 14th and 15th, 2016. New challenges offered by the application of high-k dielectric materials in micro– and nanoelectronics will be discussed by more than 80 participants from industry, research institutes and universities.
NaMLab created with the workshop a stimulating European platform for application-oriented scientist to exchange ideas and discuss latest experimental results on MIM-capacitors, process technology, leakage & reliability as well as characterization of high-k dielectrics integrated in silicon based micro– and nanoelectronics. In addition, new results in the field of ALD dielectrics in solar cells, transparent conduction oxides (TCOs) and atomic layer etching (ALE) will be discussed.