Publications
2023
- J. Zhang, J. Reif, C. Strobel, P. Chava, A. Erbe, A. Voigt, T. Mikolajick, R. Kirchner, "Dry release of MEMS origami using thin Al2O3 films for facet-based device integration", In Micro and Nano Engineering, Elsevier BV, vol. 19, pp. 100179, Jun 2023. [doi] [Bibtex & Downloads]
Dry release of MEMS origami using thin Al2O3 films for facet-based device integration
×Reference
J. Zhang, J. Reif, C. Strobel, P. Chava, A. Erbe, A. Voigt, T. Mikolajick, R. Kirchner, "Dry release of MEMS origami using thin Al2O3 films for facet-based device integration", In Micro and Nano Engineering, Elsevier BV, vol. 19, pp. 100179, Jun 2023. [doi]
Bibtex
@article{Zhang_2023,
doi = {10.1016/j.mne.2023.100179},
url = {https://doi.org/10.1016%2Fj.mne.2023.100179},
year = 2023,
month = {jun},
publisher = {Elsevier {BV}},
volume = {19},
pages = {100179},
author = {J. Zhang and J. Reif and C. Strobel and P. Chava and A. Erbe and A. Voigt and T. Mikolajick and R. Kirchner},
title = {Dry release of {MEMS} origami using thin Al2O3 films for facet-based device integration},
journal = {Micro and Nano Engineering}
}Downloads
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- Ye Yu, Anatol Prudnikau, Vladimir Lesnyak, Robert Kirchner, "Quantum Dots Facilitate 3D Two-Photon Laser Lithography", In Advanced Materials, Wiley, Apr 2023. [doi] [Bibtex & Downloads]
Quantum Dots Facilitate 3D Two-Photon Laser Lithography
×Reference
Ye Yu, Anatol Prudnikau, Vladimir Lesnyak, Robert Kirchner, "Quantum Dots Facilitate 3D Two-Photon Laser Lithography", In Advanced Materials, Wiley, Apr 2023. [doi]
Bibtex
@article{Yu_2023,
doi = {10.1002/adma.202211702},
url = {https://doi.org/10.1002%2Fadma.202211702},
year = 2023,
month = {apr},
publisher = {Wiley},
author = {Ye Yu and Anatol Prudnikau and Vladimir Lesnyak and Robert Kirchner},
title = {Quantum Dots Facilitate 3D Two-Photon Laser Lithography},
journal = {Advanced Materials}
}Downloads
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Related Paths
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2022
- Mao Wang, Ye Yu, Slawomir Prucnal, Yonder Berenc'en, Mohd Saif Shaikh, Lars Rebohle, Muhammad Bilal Khan, Vitaly Zviagin, Ren'e Hübner, Alexej Pashkin, Artur Erbe, Yordan M. Georgiev, Marius Grundmann, Manfred Helm, Robert Kirchner, Shengqiang Zhou, "Mid- and far-infrared localized surface plasmon resonances in chalcogen-hyperdoped silicon", In Nanoscale, Royal Society of Chemistry (RSC), 2022. [doi] [Bibtex & Downloads]
Mid- and far-infrared localized surface plasmon resonances in chalcogen-hyperdoped silicon
×Reference
Mao Wang, Ye Yu, Slawomir Prucnal, Yonder Berenc'en, Mohd Saif Shaikh, Lars Rebohle, Muhammad Bilal Khan, Vitaly Zviagin, Ren'e Hübner, Alexej Pashkin, Artur Erbe, Yordan M. Georgiev, Marius Grundmann, Manfred Helm, Robert Kirchner, Shengqiang Zhou, "Mid- and far-infrared localized surface plasmon resonances in chalcogen-hyperdoped silicon", In Nanoscale, Royal Society of Chemistry (RSC), 2022. [doi]
Bibtex
@article{Wang_2022,
doi = {10.1039/d1nr07274a},
url = {https://doi.org/10.1039%2Fd1nr07274a},
year = 2022,
publisher = {Royal Society of Chemistry ({RSC})},
author = {Mao Wang and Ye Yu and Slawomir Prucnal and Yonder Berenc{\'{e}}n and Mohd Saif Shaikh and Lars Rebohle and Muhammad Bilal Khan and Vitaly Zviagin and Ren{\'{e}} Hübner and Alexej Pashkin and Artur Erbe and Yordan M. Georgiev and Marius Grundmann and Manfred Helm and Robert Kirchner and Shengqiang Zhou},
title = {Mid- and far-infrared localized surface plasmon resonances in chalcogen-hyperdoped silicon},
journal = {Nanoscale}
}Downloads
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2021
- Ye Yu, Pierre Lorenz, Carsten Strobel, Joachim Zajadacz, Matthias Albert, Klaus Zimmer, Robert Kirchner, "Plasmonic 3D Self-Folding Architectures via Vacuum Microforming", In Small, Wiley, pp. 2105843, Dec 2021. [doi] [Bibtex & Downloads]
Plasmonic 3D Self-Folding Architectures via Vacuum Microforming
×Reference
Ye Yu, Pierre Lorenz, Carsten Strobel, Joachim Zajadacz, Matthias Albert, Klaus Zimmer, Robert Kirchner, "Plasmonic 3D Self-Folding Architectures via Vacuum Microforming", In Small, Wiley, pp. 2105843, Dec 2021. [doi]
Bibtex
@article{Yu_2021,
doi = {10.1002/smll.202105843},
url = {https://doi.org/10.1002%2Fsmll.202105843},
year = 2021,
month = {dec},
publisher = {Wiley},
pages = {2105843},
author = {Ye Yu and Pierre Lorenz and Carsten Strobel and Joachim Zajadacz and Matthias Albert and Klaus Zimmer and Robert Kirchner},
title = {Plasmonic 3D Self-Folding Architectures via Vacuum Microforming},
journal = {Small}
}Downloads
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- Yuan Gao, Souha Toukabri, Ye Yu, Andreas Richter, Robert Kirchner, "Large area multi-material-multi-photon 3D printing with fast in-situ material replacement", In Proceeding: Laser 3D Manufacturing VIII (Henry Helvajian and Bo Gu and Hongqiang Chen), SPIE, Mar 2021. [doi] [Bibtex & Downloads]
Large area multi-material-multi-photon 3D printing with fast in-situ material replacement
×Reference
Yuan Gao, Souha Toukabri, Ye Yu, Andreas Richter, Robert Kirchner, "Large area multi-material-multi-photon 3D printing with fast in-situ material replacement", In Proceeding: Laser 3D Manufacturing VIII (Henry Helvajian and Bo Gu and Hongqiang Chen), SPIE, Mar 2021. [doi]
Bibtex
@inproceedings{Gao_2021,
doi = {10.1117/12.2583487},
url = {https://doi.org/10.1117%2F12.2583487},
year = 2021,
month = {mar},
publisher = ,
author = {Yuan Gao and Souha Toukabri and Ye Yu and Andreas Richter and Robert Kirchner},
editor = {Henry Helvajian and Bo Gu and Hongqiang Chen},
title = {Large area multi-material-multi-photon 3D printing with fast in-situ material replacement},
booktitle = {Laser 3D Manufacturing {VIII}}
}Downloads
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2020
- Ye Yu, Daniel Schletz, Johanna Reif, Felix Winkler, Matthias Albert, Andreas Fery, Robert Kirchner, "Influences on Plasmon Resonance Linewidth in Metal-Insulator-Metal Structures Obtained via Colloidal Self-Assembly", In ACS Applied Materials & Interfaces, American Chemical Society (ACS), vol. 12, no. 50, pp. 56281–56289, Dec 2020. [doi] [Bibtex & Downloads]
Influences on Plasmon Resonance Linewidth in Metal-Insulator-Metal Structures Obtained via Colloidal Self-Assembly
×Reference
Ye Yu, Daniel Schletz, Johanna Reif, Felix Winkler, Matthias Albert, Andreas Fery, Robert Kirchner, "Influences on Plasmon Resonance Linewidth in Metal-Insulator-Metal Structures Obtained via Colloidal Self-Assembly", In ACS Applied Materials & Interfaces, American Chemical Society (ACS), vol. 12, no. 50, pp. 56281–56289, Dec 2020. [doi]
Bibtex
@article{Yu_2020,
doi = {10.1021/acsami.0c15829},
url = {https://doi.org/10.1021%2Facsami.0c15829},
year = 2020,
month = {dec},
publisher = {American Chemical Society ({ACS})},
volume = {12},
number = {50},
pages = {56281--56289},
author = {Ye Yu and Daniel Schletz and Johanna Reif and Felix Winkler and Matthias Albert and Andreas Fery and Robert Kirchner},
title = {Influences on Plasmon Resonance Linewidth in Metal-Insulator-Metal Structures Obtained via Colloidal Self-Assembly},
journal = {{ACS} Applied Materials {\&} Interfaces}
}Downloads
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- Robert Kirchner, Volker Neumann, Felix Winkler, Carsten Strobel, Sandra Völkel, Andr'e Hiess, Dimitrios Kazazis, Ulrich Künzelmann, Johann Wolfgang Bartha, "Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid", In Small, Wiley, vol. 16, no. 43, pp. 2002290, Oct 2020. [doi] [Bibtex & Downloads]
Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid
×Reference
Robert Kirchner, Volker Neumann, Felix Winkler, Carsten Strobel, Sandra Völkel, Andr'e Hiess, Dimitrios Kazazis, Ulrich Künzelmann, Johann Wolfgang Bartha, "Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid", In Small, Wiley, vol. 16, no. 43, pp. 2002290, Oct 2020. [doi]
Bibtex
@article{Kirchner_2020,
doi = {10.1002/smll.202002290},
url = {https://doi.org/10.1002%2Fsmll.202002290},
year = 2020,
month = {oct},
publisher = {Wiley},
volume = {16},
number = {43},
pages = {2002290},
author = {Robert Kirchner and Volker Neumann and Felix Winkler and Carsten Strobel and Sandra Völkel and Andr{\'{e}} Hiess and Dimitrios Kazazis and Ulrich Künzelmann and Johann Wolfgang Bartha},
title = {Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid},
journal = {Small}
}Downloads
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- Robert Kirchner, Arne Schleunitz, Ran Zhang, Helmut Schift, "Smart Origination and Functional Replication: Thermal Reflow and Innovative 3D Structures", In Journal of Photopolymer Science and Technology, Technical Association of Photopolymers, Japan, vol. 32, no. 6, pp. 799–804, Jan 2020. [doi] [Bibtex & Downloads]
Smart Origination and Functional Replication: Thermal Reflow and Innovative 3D Structures
×Reference
Robert Kirchner, Arne Schleunitz, Ran Zhang, Helmut Schift, "Smart Origination and Functional Replication: Thermal Reflow and Innovative 3D Structures", In Journal of Photopolymer Science and Technology, Technical Association of Photopolymers, Japan, vol. 32, no. 6, pp. 799–804, Jan 2020. [doi]
Bibtex
@article{Kirchner_2020,
doi = {10.2494/photopolymer.32.799},
url = {https://doi.org/10.2494%2Fphotopolymer.32.799},
year = 2020,
month = {jan},
publisher = {Technical Association of Photopolymers, Japan},
volume = {32},
number = {6},
pages = {799--804},
author = {Robert Kirchner and Arne Schleunitz and Ran Zhang and Helmut Schift},
title = {Smart Origination and Functional Replication: Thermal Reflow and Innovative 3D Structures},
journal = {Journal of Photopolymer Science and Technology}
}Downloads
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2019
- Robert Kirchner, Jun Taniguchi, "Toward full three-dimensional (3D) high volume fabrication", In Advanced Optical Technologies, Walter de Gruyter GmbH, vol. 8, no. 3-4, pp. 171–173, May 2019. [doi] [Bibtex & Downloads]
Toward full three-dimensional (3D) high volume fabrication
×Reference
Robert Kirchner, Jun Taniguchi, "Toward full three-dimensional (3D) high volume fabrication", In Advanced Optical Technologies, Walter de Gruyter GmbH, vol. 8, no. 3-4, pp. 171–173, May 2019. [doi]
Bibtex
@article{Kirchner_2019,
doi = {10.1515/aot-2019-0030},
url = {https://doi.org/10.1515%2Faot-2019-0030},
year = 2019,
month = {may},
publisher = {Walter de Gruyter {GmbH}},
volume = {8},
number = {3-4},
pages = {171--173},
author = {Robert Kirchner and Jun Taniguchi},
title = {Toward full three-dimensional (3D) high volume fabrication},
journal = {Advanced Optical Technologies}
}Downloads
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- Robert Kirchner, Vitaliy A. Guzenko, Helmut Schift, "Single-digit 6-nm multilevel patterns by electron beam grayscale lithography", In Advanced Optical Technologies, Walter de Gruyter GmbH, vol. 8, no. 3-4, pp. 175–180, Apr 2019. [doi] [Bibtex & Downloads]
Single-digit 6-nm multilevel patterns by electron beam grayscale lithography
×Reference
Robert Kirchner, Vitaliy A. Guzenko, Helmut Schift, "Single-digit 6-nm multilevel patterns by electron beam grayscale lithography", In Advanced Optical Technologies, Walter de Gruyter GmbH, vol. 8, no. 3-4, pp. 175–180, Apr 2019. [doi]
Bibtex
@article{Kirchner_2019,
doi = {10.1515/aot-2019-0016},
url = {https://doi.org/10.1515%2Faot-2019-0016},
year = 2019,
month = {apr},
publisher = {Walter de Gruyter {GmbH}},
volume = {8},
number = {3-4},
pages = {175--180},
author = {Robert Kirchner and Vitaliy A. Guzenko and Helmut Schift},
title = {Single-digit 6-nm multilevel patterns by electron beam grayscale lithography},
journal = {Advanced Optical Technologies}
}Downloads
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- Robert Kirchner, Helmut Schift, "Thermal reflow of polymers for innovative and smart 3D structures: A review", In Materials Science in Semiconductor Processing, Elsevier BV, vol. 92, pp. 58–72, Mar 2019. [doi] [Bibtex & Downloads]
Thermal reflow of polymers for innovative and smart 3D structures: A review
×Reference
Robert Kirchner, Helmut Schift, "Thermal reflow of polymers for innovative and smart 3D structures: A review", In Materials Science in Semiconductor Processing, Elsevier BV, vol. 92, pp. 58–72, Mar 2019. [doi]
Bibtex
@article{Kirchner_2019,
doi = {10.1016/j.mssp.2018.07.032},
url = {https://doi.org/10.1016%2Fj.mssp.2018.07.032},
year = 2019,
month = {mar},
publisher = {Elsevier {BV}},
volume = {92},
pages = {58--72},
author = {Robert Kirchner and Helmut Schift},
title = {Thermal reflow of polymers for innovative and smart 3D structures: A review},
journal = {Materials Science in Semiconductor Processing}
}Downloads
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2018
- Robert Kirchner, "Benchmarking surface selective vacuum ultraviolet and thermal postprocessing of thermoplastics for ultrasmooth 3-D-printed micro-optics", In Optical Engineering, SPIE-Intl Soc Optical Eng, vol. 57, no. 04, pp. 1, Jan 2018. [doi] [Bibtex & Downloads]
Benchmarking surface selective vacuum ultraviolet and thermal postprocessing of thermoplastics for ultrasmooth 3-D-printed micro-optics
×Reference
Robert Kirchner, "Benchmarking surface selective vacuum ultraviolet and thermal postprocessing of thermoplastics for ultrasmooth 3-D-printed micro-optics", In Optical Engineering, SPIE-Intl Soc Optical Eng, vol. 57, no. 04, pp. 1, Jan 2018. [doi]
Bibtex
@article{Kirchner_2018,
doi = {10.1117/1.oe.57.4.041403},
url = {https://doi.org/10.1117%2F1.oe.57.4.041403},
year = 2018,
month = {jan},
publisher = {{SPIE}-Intl Soc Optical Eng},
volume = {57},
number = {04},
pages = {1},
author = {Robert Kirchner},
title = {Benchmarking surface selective vacuum ultraviolet and thermal postprocessing of thermoplastics for ultrasmooth 3-D-printed micro-optics},
journal = {Optical Engineering}
}Downloads
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- Robert Kirchner, Nachiappan Chidambaram, Mirco Altana, Helmut Schift, "Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography", In Proceeding: Nanophotonics Australasia 2017 (James W. M. Chon and Baohua Jia), SPIE, Jan 2018. [doi] [Bibtex & Downloads]
Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography
×Reference
Robert Kirchner, Nachiappan Chidambaram, Mirco Altana, Helmut Schift, "Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography", In Proceeding: Nanophotonics Australasia 2017 (James W. M. Chon and Baohua Jia), SPIE, Jan 2018. [doi]
Bibtex
@inproceedings{Kirchner_2018,
doi = {10.1117/12.2283236},
url = {https://doi.org/10.1117%2F12.2283236},
year = 2018,
month = {jan},
publisher = ,
author = {Robert Kirchner and Nachiappan Chidambaram and Mirco Altana and Helmut Schift},
editor = {James W. M. Chon and Baohua Jia},
title = {Surface smoothening of the inherent roughness of micro-lenses fabricated with 2-photon lithography},
booktitle = {Nanophotonics Australasia 2017}
}Downloads
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2017
- Corinna Kaspar, Jörg Butschke, Mathias Irmscher, Stephan Martens, Holger Sailer, Robert Kirchner, Vitaliy A. Guzenko, Helmut Schift, Joachim N. Burghartz, "Adjustable sidewall slopes by electron-beam exposure layout", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 35, no. 6, pp. 06G501, Nov 2017. [doi] [Bibtex & Downloads]
Adjustable sidewall slopes by electron-beam exposure layout
×Reference
Corinna Kaspar, Jörg Butschke, Mathias Irmscher, Stephan Martens, Holger Sailer, Robert Kirchner, Vitaliy A. Guzenko, Helmut Schift, Joachim N. Burghartz, "Adjustable sidewall slopes by electron-beam exposure layout", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 35, no. 6, pp. 06G501, Nov 2017. [doi]
Bibtex
@article{Kaspar_2017,
doi = {10.1116/1.4993724},
url = {https://doi.org/10.1116%2F1.4993724},
year = 2017,
month = {nov},
publisher = {American Vacuum Society},
volume = {35},
number = {6},
pages = {06G501},
author = {Corinna Kaspar and Jörg Butschke and Mathias Irmscher and Stephan Martens and Holger Sailer and Robert Kirchner and Vitaliy A. Guzenko and Helmut Schift and Joachim N. Burghartz},
title = {Adjustable sidewall slopes by electron-beam exposure layout},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}Downloads
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- Roberto Fallica, Dimitrios Kazazis, Robert Kirchner, Anja Voigt, Iacopo Mochi, Helmut Schift, Yasin Ekinci, "Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 35, no. 6, pp. 061603, Nov 2017. [doi] [Bibtex & Downloads]
Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
×Reference
Roberto Fallica, Dimitrios Kazazis, Robert Kirchner, Anja Voigt, Iacopo Mochi, Helmut Schift, Yasin Ekinci, "Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 35, no. 6, pp. 061603, Nov 2017. [doi]
Bibtex
@article{Fallica_2017,
doi = {10.1116/1.5003476},
url = {https://doi.org/10.1116%2F1.5003476},
year = 2017,
month = {nov},
publisher = {American Vacuum Society},
volume = {35},
number = {6},
pages = {061603},
author = {Roberto Fallica and Dimitrios Kazazis and Robert Kirchner and Anja Voigt and Iacopo Mochi and Helmut Schift and Yasin Ekinci},
title = {Lithographic performance of {ZEP}520A and mr-{PosEBR} resists exposed by electron beam and extreme ultraviolet lithography},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}Downloads
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- Robert Kirchner, Roel Hoekstra, Nachiappan Chidambaram, Helmut Schift, "Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics", In Proceeding: 33rd European Mask and Lithography Conference (Uwe F.W. Behringer and Jo Finders), SPIE, Sep 2017. [doi] [Bibtex & Downloads]
Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics
×Reference
Robert Kirchner, Roel Hoekstra, Nachiappan Chidambaram, Helmut Schift, "Depth-profiling of vertical material contrast after VUV exposure for contact-free polishing of 3D polymer micro-optics", In Proceeding: 33rd European Mask and Lithography Conference (Uwe F.W. Behringer and Jo Finders), SPIE, Sep 2017. [doi]
Bibtex
@inproceedings{Kirchner_2017,
doi = {10.1117/12.2279712},
url = {https://doi.org/10.1117%2F12.2279712},
year = 2017,
month = {sep},
publisher = ,
author = {Robert Kirchner and Roel Hoekstra and Nachiappan Chidambaram and Helmut Schift},
editor = {Uwe F.W. Behringer and Jo Finders},
title = {Depth-profiling of vertical material contrast after {VUV} exposure for contact-free polishing of 3D polymer micro-optics},
booktitle = {33rd European Mask and Lithography Conference}
}Downloads
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- Roberto Fallica, Robert Kirchner, Helmut Schift, Yasin Ekinci, "High-resolution grayscale patterning using extreme ultraviolet interference lithography", In Microelectronic Engineering, Elsevier BV, vol. 177, pp. 1–5, Jun 2017. [doi] [Bibtex & Downloads]
High-resolution grayscale patterning using extreme ultraviolet interference lithography
×Reference
Roberto Fallica, Robert Kirchner, Helmut Schift, Yasin Ekinci, "High-resolution grayscale patterning using extreme ultraviolet interference lithography", In Microelectronic Engineering, Elsevier BV, vol. 177, pp. 1–5, Jun 2017. [doi]
Bibtex
@article{Fallica_2017,
doi = {10.1016/j.mee.2017.01.007},
url = {https://doi.org/10.1016%2Fj.mee.2017.01.007},
year = 2017,
month = {jun},
publisher = {Elsevier {BV}},
volume = {177},
pages = {1--5},
author = {Roberto Fallica and Robert Kirchner and Helmut Schift and Yasin Ekinci},
title = {High-resolution grayscale patterning using extreme ultraviolet interference lithography},
journal = {Microelectronic Engineering}
}Downloads
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- Nachiappan Chidambaram, Robert Kirchner, Roberto Fallica, Libo Yu, Mirco Altana, Helmut Schift, "Selective Surface Smoothening of Polymer Microlenses by Depth Confined Softening", In Advanced Materials Technologies, Wiley, vol. 2, no. 5, pp. 1700018, Mar 2017. [doi] [Bibtex & Downloads]
Selective Surface Smoothening of Polymer Microlenses by Depth Confined Softening
×Reference
Nachiappan Chidambaram, Robert Kirchner, Roberto Fallica, Libo Yu, Mirco Altana, Helmut Schift, "Selective Surface Smoothening of Polymer Microlenses by Depth Confined Softening", In Advanced Materials Technologies, Wiley, vol. 2, no. 5, pp. 1700018, Mar 2017. [doi]
Bibtex
@article{Chidambaram_2017,
doi = {10.1002/admt.201700018},
url = {https://doi.org/10.1002%2Fadmt.201700018},
year = 2017,
month = {mar},
publisher = {Wiley},
volume = {2},
number = {5},
pages = {1700018},
author = {Nachiappan Chidambaram and Robert Kirchner and Roberto Fallica and Libo Yu and Mirco Altana and Helmut Schift},
title = {Selective Surface Smoothening of Polymer Microlenses by Depth Confined Softening},
journal = {Advanced Materials Technologies}
}Downloads
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- Helmut Schift, Nachiappan Chidambaram, Mirco Altana, Robert Kirchner, "Selective surface smoothening of 3D micro-optical elements", SPIE Proceedings (Christopher Bencher and Joy Y. Cheng), SPIE, Mar 2017. [doi] [Bibtex & Downloads]
Selective surface smoothening of 3D micro-optical elements
×Reference
Helmut Schift, Nachiappan Chidambaram, Mirco Altana, Robert Kirchner, "Selective surface smoothening of 3D micro-optical elements", SPIE Proceedings (Christopher Bencher and Joy Y. Cheng), SPIE, Mar 2017. [doi]
Bibtex
@inproceedings{Schift_2017,
doi = {10.1117/12.2256358},
url = {https://doi.org/10.1117%2F12.2256358},
year = 2017,
month = {mar},
publisher = ,
author = {Helmut Schift and Nachiappan Chidambaram and Mirco Altana and Robert Kirchner},
editor = {Christopher Bencher and Joy Y. Cheng},
title = {Selective surface smoothening of 3D micro-optical elements},
booktitle = {{SPIE} Proceedings}
}Downloads
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- Robert Kirchner, Nachiappan Chidambaram, Mirco Altana, Helmut Schift, "How post-processing by selective thermal reflow can reduce the roughness of 3D lithography in micro-optical lenses", In Proceeding: Laser 3D Manufacturing IV (Bo Gu and Henry Helvajian and Alberto Piqu'e and Corey M. Dunsky and Jian Liu), SPIE, Feb 2017. [doi] [Bibtex & Downloads]
How post-processing by selective thermal reflow can reduce the roughness of 3D lithography in micro-optical lenses
×Reference
Robert Kirchner, Nachiappan Chidambaram, Mirco Altana, Helmut Schift, "How post-processing by selective thermal reflow can reduce the roughness of 3D lithography in micro-optical lenses", In Proceeding: Laser 3D Manufacturing IV (Bo Gu and Henry Helvajian and Alberto Piqu'e and Corey M. Dunsky and Jian Liu), SPIE, Feb 2017. [doi]
Bibtex
@inproceedings{Kirchner_2017,
doi = {10.1117/12.2258090},
url = {https://doi.org/10.1117%2F12.2258090},
year = 2017,
month = {feb},
publisher = ,
author = {Robert Kirchner and Nachiappan Chidambaram and Mirco Altana and Helmut Schift},
editor = {Bo Gu and Henry Helvajian and Alberto Piqu{\'{e}} and Corey M. Dunsky and Jian Liu},
title = {How post-processing by selective thermal reflow can reduce the roughness of 3D lithography in micro-optical lenses},
booktitle = {Laser 3D Manufacturing {IV}}
}Downloads
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2016
- Roberto Fallica, Robert Kirchner, Yasin Ekinci, Dominique Mailly, "Comparative study of resists and lithographic tools using the Lumped Parameter Model", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 34, no. 6, pp. 06K702, Nov 2016. [doi] [Bibtex & Downloads]
Comparative study of resists and lithographic tools using the Lumped Parameter Model
×Reference
Roberto Fallica, Robert Kirchner, Yasin Ekinci, Dominique Mailly, "Comparative study of resists and lithographic tools using the Lumped Parameter Model", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 34, no. 6, pp. 06K702, Nov 2016. [doi]
Bibtex
@article{Fallica_2016,
doi = {10.1116/1.4967183},
url = {https://doi.org/10.1116%2F1.4967183},
year = 2016,
month = {nov},
publisher = {American Vacuum Society},
volume = {34},
number = {6},
pages = {06K702},
author = {Roberto Fallica and Robert Kirchner and Yasin Ekinci and Dominique Mailly},
title = {Comparative study of resists and lithographic tools using the Lumped Parameter Model},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}Downloads
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- Nachiappan Chidambaram, Robert Kirchner, Mirco Altana, Helmut Schift, "High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 34, no. 6, pp. 06K401, Nov 2016. [doi] [Bibtex & Downloads]
High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps
×Reference
Nachiappan Chidambaram, Robert Kirchner, Mirco Altana, Helmut Schift, "High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 34, no. 6, pp. 06K401, Nov 2016. [doi]
Bibtex
@article{Chidambaram_2016,
doi = {10.1116/1.4961250},
url = {https://doi.org/10.1116%2F1.4961250},
year = 2016,
month = {nov},
publisher = {American Vacuum Society},
volume = {34},
number = {6},
pages = {06K401},
author = {Nachiappan Chidambaram and Robert Kirchner and Mirco Altana and Helmut Schift},
title = {High fidelity 3D thermal nanoimprint with {UV} curable polydimethyl siloxane stamps},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}Downloads
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- D. Virganavi\vcius, V.J. Cadarso, R. Kirchner, L. Stankevi\vcius, T. Tamulevi\vcius, S. Tamulevi\vcius, H. Schift, "Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask", In Applied Surface Science, Elsevier BV, vol. 385, pp. 145–152, Nov 2016. [doi] [Bibtex & Downloads]
Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask
×Reference
D. Virganavi\vcius, V.J. Cadarso, R. Kirchner, L. Stankevi\vcius, T. Tamulevi\vcius, S. Tamulevi\vcius, H. Schift, "Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask", In Applied Surface Science, Elsevier BV, vol. 385, pp. 145–152, Nov 2016. [doi]
Bibtex
@article{Virganavi_ius_2016,
doi = {10.1016/j.apsusc.2016.05.100},
url = {https://doi.org/10.1016%2Fj.apsusc.2016.05.100},
year = 2016,
month = {nov},
publisher = {Elsevier {BV}},
volume = {385},
pages = {145--152},
author = {D. Virganavi{\v{c}}ius and V.J. Cadarso and R. Kirchner and L. Stankevi{\v{c}}ius and T. Tamulevi{\v{c}}ius and S. Tamulevi{\v{c}}ius and H. Schift},
title = {Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist ({SiPol}) as a hard mask},
journal = {Applied Surface Science}
}Downloads
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- Michele Pianigiani, Robert Kirchner, Enrico Sovernigo, Alessandro Pozzato, Massimo Tormen, Helmut Schift, "Effect of nanoimprint on the elastic modulus of PMMA: Comparison between standard and ultrafast thermal NIL", In Microelectronic Engineering, Elsevier BV, vol. 155, pp. 85–91, Apr 2016. [doi] [Bibtex & Downloads]
Effect of nanoimprint on the elastic modulus of PMMA: Comparison between standard and ultrafast thermal NIL
×Reference
Michele Pianigiani, Robert Kirchner, Enrico Sovernigo, Alessandro Pozzato, Massimo Tormen, Helmut Schift, "Effect of nanoimprint on the elastic modulus of PMMA: Comparison between standard and ultrafast thermal NIL", In Microelectronic Engineering, Elsevier BV, vol. 155, pp. 85–91, Apr 2016. [doi]
Bibtex
@article{Pianigiani_2016,
doi = {10.1016/j.mee.2016.03.019},
url = {https://doi.org/10.1016%2Fj.mee.2016.03.019},
year = 2016,
month = {apr},
publisher = {Elsevier {BV}},
volume = {155},
pages = {85--91},
author = {Michele Pianigiani and Robert Kirchner and Enrico Sovernigo and Alessandro Pozzato and Massimo Tormen and Helmut Schift},
title = {Effect of nanoimprint on the elastic modulus of {PMMA}: Comparison between standard and ultrafast thermal {NIL}},
journal = {Microelectronic Engineering}
}Downloads
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- Stefan Pfirrmann, Robert Kirchner, Olga Lohse, Vitaliy A. Guzenko, Anja Voigt, Irina Harder, Anett Kolander, Helmut Schift, Gabi Grützner, "mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning", SPIE Proceedings (Christoph K. Hohle and Todd R. Younkin), SPIE, Mar 2016. [doi] [Bibtex & Downloads]
mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
×Reference
Stefan Pfirrmann, Robert Kirchner, Olga Lohse, Vitaliy A. Guzenko, Anja Voigt, Irina Harder, Anett Kolander, Helmut Schift, Gabi Grützner, "mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning", SPIE Proceedings (Christoph K. Hohle and Todd R. Younkin), SPIE, Mar 2016. [doi]
Bibtex
@inproceedings{Pfirrmann_2016,
doi = {10.1117/12.2219165},
url = {https://doi.org/10.1117%2F12.2219165},
year = 2016,
month = {mar},
publisher = ,
author = {Stefan Pfirrmann and Robert Kirchner and Olga Lohse and Vitaliy A. Guzenko and Anja Voigt and Irina Harder and Anett Kolander and Helmut Schift and Gabi Grützner},
editor = {Christoph K. Hohle and Todd R. Younkin},
title = {mr-{PosEBR}: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning},
booktitle = {{SPIE} Proceedings}
}Downloads
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- R. Kirchner, V.A. Guzenko, I. Vartiainen, N. Chidambaram, H. Schift, "ZEP520A \textemdash A resist for electron-beam grayscale lithography and thermal reflow", In Microelectronic Engineering, Elsevier BV, vol. 153, pp. 71–76, Mar 2016. [doi] [Bibtex & Downloads]
ZEP520A \textemdash A resist for electron-beam grayscale lithography and thermal reflow
×Reference
R. Kirchner, V.A. Guzenko, I. Vartiainen, N. Chidambaram, H. Schift, "ZEP520A \textemdash A resist for electron-beam grayscale lithography and thermal reflow", In Microelectronic Engineering, Elsevier BV, vol. 153, pp. 71–76, Mar 2016. [doi]
Bibtex
@article{Kirchner_2016,
doi = {10.1016/j.mee.2016.01.017},
url = {https://doi.org/10.1016%2Fj.mee.2016.01.017},
year = 2016,
month = {mar},
publisher = {Elsevier {BV}},
volume = {153},
pages = {71--76},
author = {R. Kirchner and V.A. Guzenko and I. Vartiainen and N. Chidambaram and H. Schift},
title = {{ZEP}520A {\textemdash} A resist for electron-beam grayscale lithography and thermal reflow},
journal = {Microelectronic Engineering}
}Downloads
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2015
- M. Mühlberger, M. Rohn, J. Danzberger, E. Sonntag, A. Rank, L. Schumm, R. Kirchner, C. Forsich, S. Gorb, B. Einwögerer, E. Trappl, D. Heim, H. Schift, I. Bergmair, "UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces", In Microelectronic Engineering, Elsevier BV, vol. 141, pp. 140–144, Jun 2015. [doi] [Bibtex & Downloads]
UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces
×Reference
M. Mühlberger, M. Rohn, J. Danzberger, E. Sonntag, A. Rank, L. Schumm, R. Kirchner, C. Forsich, S. Gorb, B. Einwögerer, E. Trappl, D. Heim, H. Schift, I. Bergmair, "UV-NIL fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces", In Microelectronic Engineering, Elsevier BV, vol. 141, pp. 140–144, Jun 2015. [doi]
Bibtex
@article{M_hlberger_2015,
doi = {10.1016/j.mee.2015.02.051},
url = {https://doi.org/10.1016%2Fj.mee.2015.02.051},
year = 2015,
month = {jun},
publisher = {Elsevier {BV}},
volume = {141},
pages = {140--144},
author = {M. Mühlberger and M. Rohn and J. Danzberger and E. Sonntag and A. Rank and L. Schumm and R. Kirchner and C. Forsich and S. Gorb and B. Einwögerer and E. Trappl and D. Heim and H. Schift and I. Bergmair},
title = {{UV}-{NIL} fabricated bio-inspired inlays for injection molding to influence the friction behavior of ceramic surfaces},
journal = {Microelectronic Engineering}
}Downloads
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- R. Kirchner, H. Schift, "The ascent of high resolution and high volume 3D replication", In Microelectronic Engineering, Elsevier BV, vol. 141, pp. 243–244, Jun 2015. [doi] [Bibtex & Downloads]
The ascent of high resolution and high volume 3D replication
×Reference
R. Kirchner, H. Schift, "The ascent of high resolution and high volume 3D replication", In Microelectronic Engineering, Elsevier BV, vol. 141, pp. 243–244, Jun 2015. [doi]
Bibtex
@article{Kirchner_2015,
doi = {10.1016/j.mee.2015.04.082},
url = {https://doi.org/10.1016%2Fj.mee.2015.04.082},
year = 2015,
month = {jun},
publisher = {Elsevier {BV}},
volume = {141},
pages = {243--244},
author = {R. Kirchner and H. Schift},
title = {The ascent of high resolution and high volume 3D replication},
journal = {Microelectronic Engineering}
}Downloads
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- R. Kirchner, V.A. Guzenko, M. Rohn, E. Sonntag, M. Mühlberger, I. Bergmair, H. Schift, "Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration", In Microelectronic Engineering, Elsevier BV, vol. 141, pp. 107–111, Jun 2015. [doi] [Bibtex & Downloads]
Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration
×Reference
R. Kirchner, V.A. Guzenko, M. Rohn, E. Sonntag, M. Mühlberger, I. Bergmair, H. Schift, "Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration", In Microelectronic Engineering, Elsevier BV, vol. 141, pp. 107–111, Jun 2015. [doi]
Bibtex
@article{Kirchner_2015,
doi = {10.1016/j.mee.2015.02.014},
url = {https://doi.org/10.1016%2Fj.mee.2015.02.014},
year = 2015,
month = {jun},
publisher = {Elsevier {BV}},
volume = {141},
pages = {107--111},
author = {R. Kirchner and V.A. Guzenko and M. Rohn and E. Sonntag and M. Mühlberger and I. Bergmair and H. Schift},
title = {Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration},
journal = {Microelectronic Engineering}
}Downloads
No Downloads available for this publication
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2014
- Robert Kirchner, Helmut Schift, "Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 32, no. 6, pp. 06F701, Nov 2014. [doi] [Bibtex & Downloads]
Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver
×Reference
Robert Kirchner, Helmut Schift, "Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 32, no. 6, pp. 06F701, Nov 2014. [doi]
Bibtex
@article{Kirchner_2014,
doi = {10.1116/1.4896480},
url = {https://doi.org/10.1116%2F1.4896480},
year = 2014,
month = {nov},
publisher = {American Vacuum Society},
volume = {32},
number = {6},
pages = {06F701},
author = {Robert Kirchner and Helmut Schift},
title = {Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}Downloads
No Downloads available for this publication
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- R Kirchner, A Schleunitz, H Schift, "Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver", In Journal of Micromechanics and Microengineering, IOP Publishing, vol. 24, no. 5, pp. 055010, Apr 2014. [doi] [Bibtex & Downloads]
Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver
×Reference
R Kirchner, A Schleunitz, H Schift, "Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver", In Journal of Micromechanics and Microengineering, IOP Publishing, vol. 24, no. 5, pp. 055010, Apr 2014. [doi]
Bibtex
@article{Kirchner_2014,
doi = {10.1088/0960-1317/24/5/055010},
url = {https://doi.org/10.1088%2F0960-1317%2F24%2F5%2F055010},
year = 2014,
month = {apr},
publisher = {{IOP} Publishing},
volume = {24},
number = {5},
pages = {055010},
author = {R Kirchner and A Schleunitz and H Schift},
title = {Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver},
journal = {Journal of Micromechanics and Microengineering}
}Downloads
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- Arne Schleunitz, Vitaliy A Guzenko, Martin Messerschmidt, Hakan Atasoy, Robert Kirchner, Helmut Schift, "Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers", In Nano Convergence, Springer Science and Business Media LLC, vol. 1, no. 1, Feb 2014. [doi] [Bibtex & Downloads]
Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers
×Reference
Arne Schleunitz, Vitaliy A Guzenko, Martin Messerschmidt, Hakan Atasoy, Robert Kirchner, Helmut Schift, "Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration (TASTE) of polymers", In Nano Convergence, Springer Science and Business Media LLC, vol. 1, no. 1, Feb 2014. [doi]
Bibtex
@article{Schleunitz_2014,
doi = {10.1186/s40580-014-0007-5},
url = {https://doi.org/10.1186%2Fs40580-014-0007-5},
year = 2014,
month = {feb},
publisher = {Springer Science and Business Media {LLC}},
volume = {1},
number = {1},
author = {Arne Schleunitz and Vitaliy A Guzenko and Martin Messerschmidt and Hakan Atasoy and Robert Kirchner and Helmut Schift},
title = {Novel 3D micro- and nanofabrication method using thermally activated selective topography equilibration ({TASTE}) of polymers},
journal = {Nano Convergence}
}Downloads
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2013
- Andreas Finn, Bo Lu, Robert Kirchner, Xaver Thrun, Karola Richter, Wolf-Joachim Fischer, "High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning", In Microelectronic Engineering, Elsevier BV, vol. 110, pp. 112–118, Oct 2013. [doi] [Bibtex & Downloads]
High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning
×Reference
Andreas Finn, Bo Lu, Robert Kirchner, Xaver Thrun, Karola Richter, Wolf-Joachim Fischer, "High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning", In Microelectronic Engineering, Elsevier BV, vol. 110, pp. 112–118, Oct 2013. [doi]
Bibtex
@article{Finn_2013,
doi = {10.1016/j.mee.2013.02.065},
url = {https://doi.org/10.1016%2Fj.mee.2013.02.065},
year = 2013,
month = {oct},
publisher = {Elsevier {BV}},
volume = {110},
pages = {112--118},
author = {Andreas Finn and Bo Lu and Robert Kirchner and Xaver Thrun and Karola Richter and Wolf-Joachim Fischer},
title = {High aspect ratio pattern collapse of polymeric {UV}-nano-imprint molds due to cleaning},
journal = {Microelectronic Engineering}
}Downloads
No Downloads available for this publication
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- G. Scheunert, V. Hoffmann, R. Kullock, J. R. Whyte, R. Kirchner, S. Grafström, W.-J. Fischer, L. M. Eng, "Utilizing Dog-Boning to Build up High-Aspect-Ratio Nanofences", In Journal of The Electrochemical Society, The Electrochemical Society, vol. 161, no. 1, pp. D26–D30, Oct 2013. [doi] [Bibtex & Downloads]
Utilizing Dog-Boning to Build up High-Aspect-Ratio Nanofences
×Reference
G. Scheunert, V. Hoffmann, R. Kullock, J. R. Whyte, R. Kirchner, S. Grafström, W.-J. Fischer, L. M. Eng, "Utilizing Dog-Boning to Build up High-Aspect-Ratio Nanofences", In Journal of The Electrochemical Society, The Electrochemical Society, vol. 161, no. 1, pp. D26–D30, Oct 2013. [doi]
Bibtex
@article{Scheunert_2013,
doi = {10.1149/2.024401jes},
url = {https://doi.org/10.1149%2F2.024401jes},
year = 2013,
month = {oct},
publisher = {The Electrochemical Society},
volume = {161},
number = {1},
pages = {D26--D30},
author = {G. Scheunert and V. Hoffmann and R. Kullock and J. R. Whyte and R. Kirchner and S. Grafström and W.-J. Fischer and L. M. Eng},
title = {Utilizing Dog-Boning to Build up High-Aspect-Ratio Nanofences},
journal = {Journal of The Electrochemical Society}
}Downloads
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- Lichao Teng, Matthias Plötner, Alexander Türke, Barbara Adolphi, Andreas Finn, Robert Kirchner, Wolf-Joachim Fischer, "Nanoimprint assisted inkjet printing to fabricate sub-micron channel organic field effect transistors", In Microelectronic Engineering, Elsevier BV, vol. 110, pp. 292–297, Oct 2013. [doi] [Bibtex & Downloads]
Nanoimprint assisted inkjet printing to fabricate sub-micron channel organic field effect transistors
×Reference
Lichao Teng, Matthias Plötner, Alexander Türke, Barbara Adolphi, Andreas Finn, Robert Kirchner, Wolf-Joachim Fischer, "Nanoimprint assisted inkjet printing to fabricate sub-micron channel organic field effect transistors", In Microelectronic Engineering, Elsevier BV, vol. 110, pp. 292–297, Oct 2013. [doi]
Bibtex
@article{Teng_2013,
doi = {10.1016/j.mee.2013.02.027},
url = {https://doi.org/10.1016%2Fj.mee.2013.02.027},
year = 2013,
month = {oct},
publisher = {Elsevier {BV}},
volume = {110},
pages = {292--297},
author = {Lichao Teng and Matthias Plötner and Alexander Türke and Barbara Adolphi and Andreas Finn and Robert Kirchner and Wolf-Joachim Fischer},
title = {Nanoimprint assisted inkjet printing to fabricate sub-micron channel organic field effect transistors},
journal = {Microelectronic Engineering}
}Downloads
No Downloads available for this publication
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2012
- R. Landgraf, T. Haugwitz, R. Kirchner, W.-J. Fischer, "Planar optical microring resonators used as biosensors: guidelines for designing polymer compared to semiconductor-based waveguides", SPIE Proceedings (Brian Culshaw and Yanbiao Liao and Anbo Wang and Xiaoyi Bao and Xudong Fan), SPIE, Nov 2012. [doi] [Bibtex & Downloads]
Planar optical microring resonators used as biosensors: guidelines for designing polymer compared to semiconductor-based waveguides
×Reference
R. Landgraf, T. Haugwitz, R. Kirchner, W.-J. Fischer, "Planar optical microring resonators used as biosensors: guidelines for designing polymer compared to semiconductor-based waveguides", SPIE Proceedings (Brian Culshaw and Yanbiao Liao and Anbo Wang and Xiaoyi Bao and Xudong Fan), SPIE, Nov 2012. [doi]
Bibtex
@inproceedings{Landgraf_2012,
doi = {10.1117/12.999970},
url = {https://doi.org/10.1117%2F12.999970},
year = 2012,
month = {nov},
publisher = ,
author = {R. Landgraf and T. Haugwitz and R. Kirchner and W.-J. Fischer},
editor = {Brian Culshaw and Yanbiao Liao and Anbo Wang and Xiaoyi Bao and Xudong Fan},
title = {Planar optical microring resonators used as biosensors: guidelines for designing polymer compared to semiconductor-based waveguides},
booktitle = {{SPIE} Proceedings}
}Downloads
No Downloads available for this publication
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- Andreas Finn, Ren'e Hensel, Falk Hagemann, Robert Kirchner, Andreas Jahn, Wolf-Joachim Fischer, "Geometrical properties of multilayer nano-imprint-lithography molds for optical applications", In Microelectronic Engineering, Elsevier BV, vol. 98, pp. 284–287, Oct 2012. [doi] [Bibtex & Downloads]
Geometrical properties of multilayer nano-imprint-lithography molds for optical applications
×Reference
Andreas Finn, Ren'e Hensel, Falk Hagemann, Robert Kirchner, Andreas Jahn, Wolf-Joachim Fischer, "Geometrical properties of multilayer nano-imprint-lithography molds for optical applications", In Microelectronic Engineering, Elsevier BV, vol. 98, pp. 284–287, Oct 2012. [doi]
Bibtex
@article{Finn_2012,
doi = {10.1016/j.mee.2012.04.022},
url = {https://doi.org/10.1016%2Fj.mee.2012.04.022},
year = 2012,
month = {oct},
publisher = {Elsevier {BV}},
volume = {98},
pages = {284--287},
author = {Andreas Finn and Ren{\'{e}} Hensel and Falk Hagemann and Robert Kirchner and Andreas Jahn and Wolf-Joachim Fischer},
title = {Geometrical properties of multilayer nano-imprint-lithography molds for optical applications},
journal = {Microelectronic Engineering}
}Downloads
No Downloads available for this publication
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- R. Kirchner, L. Nüske, A. Finn, B. Lu, W.-J. Fischer, "Stamp-and-repeat UV-imprinting of spin-coated films: Pre-exposure and imprint defects", In Microelectronic Engineering, Elsevier BV, vol. 97, pp. 117–121, Sep 2012. [doi] [Bibtex & Downloads]
Stamp-and-repeat UV-imprinting of spin-coated films: Pre-exposure and imprint defects
×Reference
R. Kirchner, L. Nüske, A. Finn, B. Lu, W.-J. Fischer, "Stamp-and-repeat UV-imprinting of spin-coated films: Pre-exposure and imprint defects", In Microelectronic Engineering, Elsevier BV, vol. 97, pp. 117–121, Sep 2012. [doi]
Bibtex
@article{Kirchner_2012,
doi = {10.1016/j.mee.2012.03.037},
url = {https://doi.org/10.1016%2Fj.mee.2012.03.037},
year = 2012,
month = {sep},
publisher = {Elsevier {BV}},
volume = {97},
pages = {117--121},
author = {R. Kirchner and L. Nüske and A. Finn and B. Lu and W.-J. Fischer},
title = {Stamp-and-repeat {UV}-imprinting of spin-coated films: Pre-exposure and imprint defects},
journal = {Microelectronic Engineering}
}Downloads
No Downloads available for this publication
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- Lichao Teng, Robert Kirchner, Matthias Plötner, Alexander Türke, Andreas Jahn, Jian He, Falk Hagemann, Wolf-Joachim Fischer, "Fabrication and characterization of sub-500nm channel organic field effect transistor using UV nanoimprint lithography with cheap Si-mold", In Microelectronic Engineering, Elsevier BV, vol. 97, pp. 38–42, Sep 2012. [doi] [Bibtex & Downloads]
Fabrication and characterization of sub-500nm channel organic field effect transistor using UV nanoimprint lithography with cheap Si-mold
×Reference
Lichao Teng, Robert Kirchner, Matthias Plötner, Alexander Türke, Andreas Jahn, Jian He, Falk Hagemann, Wolf-Joachim Fischer, "Fabrication and characterization of sub-500nm channel organic field effect transistor using UV nanoimprint lithography with cheap Si-mold", In Microelectronic Engineering, Elsevier BV, vol. 97, pp. 38–42, Sep 2012. [doi]
Bibtex
@article{Teng_2012,
doi = {10.1016/j.mee.2012.04.004},
url = {https://doi.org/10.1016%2Fj.mee.2012.04.004},
year = 2012,
month = {sep},
publisher = {Elsevier {BV}},
volume = {97},
pages = {38--42},
author = {Lichao Teng and Robert Kirchner and Matthias Plötner and Alexander Türke and Andreas Jahn and Jian He and Falk Hagemann and Wolf-Joachim Fischer},
title = {Fabrication and characterization of sub-500nm channel organic field effect transistor using {UV} nanoimprint lithography with cheap Si-mold},
journal = {Microelectronic Engineering}
}Downloads
No Downloads available for this publication
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- R. Kirchner, A. Finn, R. Landgraf, L. Nueske, M. Vogler, W.-J. Fischer, "UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers", In Journal of Photopolymer Science and Technology, Technical Association of Photopolymers, Japan, vol. 25, no. 2, pp. 197–206, 2012. [doi] [Bibtex & Downloads]
UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers
×Reference
R. Kirchner, A. Finn, R. Landgraf, L. Nueske, M. Vogler, W.-J. Fischer, "UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers", In Journal of Photopolymer Science and Technology, Technical Association of Photopolymers, Japan, vol. 25, no. 2, pp. 197–206, 2012. [doi]
Bibtex
@article{Kirchner_2012,
doi = {10.2494/photopolymer.25.197},
url = {https://doi.org/10.2494%2Fphotopolymer.25.197},
year = 2012,
publisher = {Technical Association of Photopolymers, Japan},
volume = {25},
number = {2},
pages = {197--206},
author = {R. Kirchner and A. Finn and R. Landgraf and L. Nueske and M. Vogler and W.-J. Fischer},
title = {{UV}-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers},
journal = {Journal of Photopolymer Science and Technology}
}Downloads
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- Jürgen Uhlemann, Robert Kirchner, Klaus-Jürgen Wolter, "Biocompatibility of Packaging Materials", Chapter in Bio and Nano Packaging Techniques for Electron Devices, Springer Berlin Heidelberg, pp. 491–514, 2012. [doi] [Bibtex & Downloads]
Biocompatibility of Packaging Materials
×Reference
Jürgen Uhlemann, Robert Kirchner, Klaus-Jürgen Wolter, "Biocompatibility of Packaging Materials", Chapter in Bio and Nano Packaging Techniques for Electron Devices, Springer Berlin Heidelberg, pp. 491–514, 2012. [doi]
Bibtex
@incollection{Uhlemann_2012,
doi = {10.1007/978-3-642-28522-6_24},
url = {https://doi.org/10.1007%2F978-3-642-28522-6_24},
year = 2012,
publisher = {Springer Berlin Heidelberg},
pages = {491--514},
author = {Jürgen Uhlemann and Robert Kirchner and Klaus-Jürgen Wolter},
title = {Biocompatibility of Packaging Materials},
booktitle = {Bio and Nano Packaging Techniques for Electron Devices}
}Downloads
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- Robert Kirchner, Jonathan Derix, Andreas Nocke, Ren'e Landgraf, "Direct Nanoimprinting for Micro- and Nanosystems", Chapter in Bio and Nano Packaging Techniques for Electron Devices, Springer Berlin Heidelberg, pp. 209–242, 2012. [doi] [Bibtex & Downloads]
Direct Nanoimprinting for Micro- and Nanosystems
×Reference
Robert Kirchner, Jonathan Derix, Andreas Nocke, Ren'e Landgraf, "Direct Nanoimprinting for Micro- and Nanosystems", Chapter in Bio and Nano Packaging Techniques for Electron Devices, Springer Berlin Heidelberg, pp. 209–242, 2012. [doi]
Bibtex
@incollection{Kirchner_2012,
doi = {10.1007/978-3-642-28522-6_10},
url = {https://doi.org/10.1007%2F978-3-642-28522-6_10},
year = 2012,
publisher = {Springer Berlin Heidelberg},
pages = {209--242},
author = {Robert Kirchner and Jonathan Derix and Andreas Nocke and Ren{\'{e}} Landgraf},
title = {Direct Nanoimprinting for Micro- and Nanosystems},
booktitle = {Bio and Nano Packaging Techniques for Electron Devices}
}Downloads
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- R. Landgraf, A. Finn, R. Kirchner, T. Haugwitz, F. Deicke, W.-J. Fischer, S. Arndt, "2.4.2 Polymer Microring Resonator Directly Patterned by Multilevel-Nanoimprint: Integration into Biosensor System with a Miniaturized Microfluidic System", In Proceeding: Tagungsband, AMA Service GmbH, Von-Münchhausen-Str. 49, 31515 Wunstorf, Germany, 2012. [doi] [Bibtex & Downloads]
2.4.2 Polymer Microring Resonator Directly Patterned by Multilevel-Nanoimprint: Integration into Biosensor System with a Miniaturized Microfluidic System
×Reference
R. Landgraf, A. Finn, R. Kirchner, T. Haugwitz, F. Deicke, W.-J. Fischer, S. Arndt, "2.4.2 Polymer Microring Resonator Directly Patterned by Multilevel-Nanoimprint: Integration into Biosensor System with a Miniaturized Microfluidic System", In Proceeding: Tagungsband, AMA Service GmbH, Von-Münchhausen-Str. 49, 31515 Wunstorf, Germany, 2012. [doi]
Bibtex
@inproceedings{Landgraf_2012,
doi = {10.5162/sensoren2012/2.4.2},
url = {https://doi.org/10.5162%2Fsensoren2012%2F2.4.2},
year = 2012,
publisher = {{AMA} Service {GmbH}, Von-Münchhausen-Str. 49, 31515 Wunstorf, Germany},
author = {R. Landgraf and A. Finn and R. Kirchner and T. Haugwitz and F. Deicke and W.-J. Fischer and S. Arndt},
title = {2.4.2 Polymer Microring Resonator Directly Patterned by Multilevel-Nanoimprint: Integration into Biosensor System with a Miniaturized Microfluidic System},
booktitle = {Tagungsband}
}Downloads
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2011
- Rene Landgraf, Toni Haugwitz, Robert Kirchner, Andreas Finn, Wolf-Joachim Fischer, "Planar optical waveguide design for UV-nanoimprinted microring resonator based biosensors", 2011 IEEE SENSORS Proceedings, IEEE, Oct 2011. [doi] [Bibtex & Downloads]
Planar optical waveguide design for UV-nanoimprinted microring resonator based biosensors
×Reference
Rene Landgraf, Toni Haugwitz, Robert Kirchner, Andreas Finn, Wolf-Joachim Fischer, "Planar optical waveguide design for UV-nanoimprinted microring resonator based biosensors", 2011 IEEE SENSORS Proceedings, IEEE, Oct 2011. [doi]
Bibtex
@inproceedings{Landgraf_2011,
doi = {10.1109/icsens.2011.6127280},
url = {https://doi.org/10.1109%2Ficsens.2011.6127280},
year = 2011,
month = {oct},
publisher = ,
author = {Rene Landgraf and Toni Haugwitz and Robert Kirchner and Andreas Finn and Wolf-Joachim Fischer},
title = {Planar optical waveguide design for {UV}-nanoimprinted microring resonator based biosensors},
booktitle = {2011 {IEEE} {SENSORS} Proceedings}
}Downloads
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- R. Kirchner, A. Finn, L. Teng, M. Ploetner, A. Jahn, L. Nueske, W.-J. Fischer, "UV-nanoimprinting using non-transparent molds and non-transparent substrates", In Microelectronic Engineering, Elsevier BV, vol. 88, no. 8, pp. 2004–2008, Aug 2011. [doi] [Bibtex & Downloads]
UV-nanoimprinting using non-transparent molds and non-transparent substrates
×Reference
R. Kirchner, A. Finn, L. Teng, M. Ploetner, A. Jahn, L. Nueske, W.-J. Fischer, "UV-nanoimprinting using non-transparent molds and non-transparent substrates", In Microelectronic Engineering, Elsevier BV, vol. 88, no. 8, pp. 2004–2008, Aug 2011. [doi]
Bibtex
@article{Kirchner_2011,
doi = {10.1016/j.mee.2011.01.066},
url = {https://doi.org/10.1016%2Fj.mee.2011.01.066},
year = 2011,
month = {aug},
publisher = {Elsevier {BV}},
volume = {88},
number = {8},
pages = {2004--2008},
author = {R. Kirchner and A. Finn and L. Teng and M. Ploetner and A. Jahn and L. Nueske and W.-J. Fischer},
title = {{UV}-nanoimprinting using non-transparent molds and non-transparent substrates},
journal = {Microelectronic Engineering}
}Downloads
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- Robert Kirchner, Lichao Teng, Bo Lu, Barbara Adolphi, Wolf-Joachim Fischer, "Degradation of Perfluorotrichlorosilane Antisticking Layers: The Impact on Mold Cleaning, Ultraviolet-Nanoimprinting, and Bonded Ultraviolet-Nanoimprint Molds", In Japanese Journal of Applied Physics, IOP Publishing, vol. 50, no. 6, pp. 06GK13, Jun 2011. [doi] [Bibtex & Downloads]
Degradation of Perfluorotrichlorosilane Antisticking Layers: The Impact on Mold Cleaning, Ultraviolet-Nanoimprinting, and Bonded Ultraviolet-Nanoimprint Molds
×Reference
Robert Kirchner, Lichao Teng, Bo Lu, Barbara Adolphi, Wolf-Joachim Fischer, "Degradation of Perfluorotrichlorosilane Antisticking Layers: The Impact on Mold Cleaning, Ultraviolet-Nanoimprinting, and Bonded Ultraviolet-Nanoimprint Molds", In Japanese Journal of Applied Physics, IOP Publishing, vol. 50, no. 6, pp. 06GK13, Jun 2011. [doi]
Bibtex
@article{Kirchner_2011,
doi = {10.1143/jjap.50.06gk13},
url = {https://doi.org/10.1143%2Fjjap.50.06gk13},
year = 2011,
month = {jun},
publisher = {{IOP} Publishing},
volume = {50},
number = {6},
pages = {06GK13},
author = {Robert Kirchner and Lichao Teng and Bo Lu and Barbara Adolphi and Wolf-Joachim Fischer},
title = {Degradation of Perfluorotrichlorosilane Antisticking Layers: The Impact on Mold Cleaning, Ultraviolet-Nanoimprinting, and Bonded Ultraviolet-Nanoimprint Molds},
journal = {Japanese Journal of Applied Physics}
}Downloads
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- Robert Kirchner, Marie-Kathrin Kaiser, Barbara Adolphi, Rene Landgraf, Wolf-Joachim Fischer, "Chemical functional polymers for direct UV assisted nanoimprinting of polymeric photonic microring resonators", In physica status solidi (a), Wiley, vol. 208, no. 6, pp. 1308–1314, May 2011. [doi] [Bibtex & Downloads]
Chemical functional polymers for direct UV assisted nanoimprinting of polymeric photonic microring resonators
×Reference
Robert Kirchner, Marie-Kathrin Kaiser, Barbara Adolphi, Rene Landgraf, Wolf-Joachim Fischer, "Chemical functional polymers for direct UV assisted nanoimprinting of polymeric photonic microring resonators", In physica status solidi (a), Wiley, vol. 208, no. 6, pp. 1308–1314, May 2011. [doi]
Bibtex
@article{Kirchner_2011,
doi = {10.1002/pssa.201000949},
url = {https://doi.org/10.1002%2Fpssa.201000949},
year = 2011,
month = {may},
publisher = {Wiley},
volume = {208},
number = {6},
pages = {1308--1314},
author = {Robert Kirchner and Marie-Kathrin Kaiser and Barbara Adolphi and Rene Landgraf and Wolf-Joachim Fischer},
title = {Chemical functional polymers for direct {UV} assisted nanoimprinting of polymeric photonic microring resonators},
journal = {physica status solidi (a)}
}Downloads
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2010
- R. Kirchner, B. Adolphi, R. Landgraf, W.-J. Fischer, "Antisticking layers on antireflective chromium for hybrid (CNP) nanoimprint molds", SPIE Proceedings (Uwe F.W. Behringer and Wilhelm Maurer), SPIE, Feb 2010. [doi] [Bibtex & Downloads]
Antisticking layers on antireflective chromium for hybrid (CNP) nanoimprint molds
×Reference
R. Kirchner, B. Adolphi, R. Landgraf, W.-J. Fischer, "Antisticking layers on antireflective chromium for hybrid (CNP) nanoimprint molds", SPIE Proceedings (Uwe F.W. Behringer and Wilhelm Maurer), SPIE, Feb 2010. [doi]
Bibtex
@inproceedings{Kirchner_2010,
doi = {10.1117/12.865572},
url = {https://doi.org/10.1117%2F12.865572},
year = 2010,
month = {feb},
publisher = ,
author = {R. Kirchner and B. Adolphi and R. Landgraf and W.-J. Fischer},
editor = {Uwe F.W. Behringer and Wilhelm Maurer},
title = {Antisticking layers on antireflective chromium for hybrid ({CNP}) nanoimprint molds},
booktitle = {{SPIE} Proceedings}
}Downloads
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