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Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask
Reference
D. Virganavi\vcius, V.J. Cadarso, R. Kirchner, L. Stankevi\vcius, T. Tamulevi\vcius, S. Tamulevi\vcius, H. Schift, "Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist (SiPol) as a hard mask", In Applied Surface Science, Elsevier BV, vol. 385, pp. 145–152, Nov 2016. [doi]
Bibtex
@article{Virganavi_ius_2016,
doi = {10.1016/j.apsusc.2016.05.100},
url = {https://doi.org/10.1016%2Fj.apsusc.2016.05.100},
year = 2016,
month = {nov},
publisher = {Elsevier {BV}},
volume = {385},
pages = {145--152},
author = {D. Virganavi{\v{c}}ius and V.J. Cadarso and R. Kirchner and L. Stankevi{\v{c}}ius and T. Tamulevi{\v{c}}ius and S. Tamulevi{\v{c}}ius and H. Schift},
title = {Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist ({SiPol}) as a hard mask},
journal = {Applied Surface Science}
}
doi = {10.1016/j.apsusc.2016.05.100},
url = {https://doi.org/10.1016%2Fj.apsusc.2016.05.100},
year = 2016,
month = {nov},
publisher = {Elsevier {BV}},
volume = {385},
pages = {145--152},
author = {D. Virganavi{\v{c}}ius and V.J. Cadarso and R. Kirchner and L. Stankevi{\v{c}}ius and T. Tamulevi{\v{c}}ius and S. Tamulevi{\v{c}}ius and H. Schift},
title = {Patterning of diamond like carbon films for sensor applications using silicon containing thermoplastic resist ({SiPol}) as a hard mask},
journal = {Applied Surface Science}
}
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