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UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers
Reference
R. Kirchner, A. Finn, R. Landgraf, L. Nueske, M. Vogler, W.-J. Fischer, "UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers", In Journal of Photopolymer Science and Technology, Technical Association of Photopolymers, Japan, vol. 25, no. 2, pp. 197–206, 2012. [doi]
Bibtex
@article{Kirchner_2012,
doi = {10.2494/photopolymer.25.197},
url = {https://doi.org/10.2494%2Fphotopolymer.25.197},
year = 2012,
publisher = {Technical Association of Photopolymers, Japan},
volume = {25},
number = {2},
pages = {197--206},
author = {R. Kirchner and A. Finn and R. Landgraf and L. Nueske and M. Vogler and W.-J. Fischer},
title = {{UV}-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers},
journal = {Journal of Photopolymer Science and Technology}
}
doi = {10.2494/photopolymer.25.197},
url = {https://doi.org/10.2494%2Fphotopolymer.25.197},
year = 2012,
publisher = {Technical Association of Photopolymers, Japan},
volume = {25},
number = {2},
pages = {197--206},
author = {R. Kirchner and A. Finn and R. Landgraf and L. Nueske and M. Vogler and W.-J. Fischer},
title = {{UV}-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers},
journal = {Journal of Photopolymer Science and Technology}
}
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