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High-resolution grayscale patterning using extreme ultraviolet interference lithography
Reference
Roberto Fallica, Robert Kirchner, Helmut Schift, Yasin Ekinci, "High-resolution grayscale patterning using extreme ultraviolet interference lithography", In Microelectronic Engineering, Elsevier BV, vol. 177, pp. 1–5, Jun 2017. [doi]
Bibtex
@article{Fallica_2017,
doi = {10.1016/j.mee.2017.01.007},
url = {https://doi.org/10.1016%2Fj.mee.2017.01.007},
year = 2017,
month = {jun},
publisher = {Elsevier {BV}},
volume = {177},
pages = {1--5},
author = {Roberto Fallica and Robert Kirchner and Helmut Schift and Yasin Ekinci},
title = {High-resolution grayscale patterning using extreme ultraviolet interference lithography},
journal = {Microelectronic Engineering}
}
doi = {10.1016/j.mee.2017.01.007},
url = {https://doi.org/10.1016%2Fj.mee.2017.01.007},
year = 2017,
month = {jun},
publisher = {Elsevier {BV}},
volume = {177},
pages = {1--5},
author = {Roberto Fallica and Robert Kirchner and Helmut Schift and Yasin Ekinci},
title = {High-resolution grayscale patterning using extreme ultraviolet interference lithography},
journal = {Microelectronic Engineering}
}
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