cfaed Publications
mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
Reference
Stefan Pfirrmann, Robert Kirchner, Olga Lohse, Vitaliy A. Guzenko, Anja Voigt, Irina Harder, Anett Kolander, Helmut Schift, Gabi Grützner, "mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning", SPIE Proceedings (Christoph K. Hohle and Todd R. Younkin), SPIE, Mar 2016. [doi]
Bibtex
@inproceedings{Pfirrmann_2016,
doi = {10.1117/12.2219165},
url = {https://doi.org/10.1117%2F12.2219165},
year = 2016,
month = {mar},
publisher = ,
author = {Stefan Pfirrmann and Robert Kirchner and Olga Lohse and Vitaliy A. Guzenko and Anja Voigt and Irina Harder and Anett Kolander and Helmut Schift and Gabi Grützner},
editor = {Christoph K. Hohle and Todd R. Younkin},
title = {mr-{PosEBR}: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning},
booktitle = {{SPIE} Proceedings}
}
doi = {10.1117/12.2219165},
url = {https://doi.org/10.1117%2F12.2219165},
year = 2016,
month = {mar},
publisher = ,
author = {Stefan Pfirrmann and Robert Kirchner and Olga Lohse and Vitaliy A. Guzenko and Anja Voigt and Irina Harder and Anett Kolander and Helmut Schift and Gabi Grützner},
editor = {Christoph K. Hohle and Todd R. Younkin},
title = {mr-{PosEBR}: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning},
booktitle = {{SPIE} Proceedings}
}
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