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Adjustable sidewall slopes by electron-beam exposure layout
Reference
Corinna Kaspar, Jörg Butschke, Mathias Irmscher, Stephan Martens, Holger Sailer, Robert Kirchner, Vitaliy A. Guzenko, Helmut Schift, Joachim N. Burghartz, "Adjustable sidewall slopes by electron-beam exposure layout", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 35, no. 6, pp. 06G501, Nov 2017. [doi]
Bibtex
@article{Kaspar_2017,
doi = {10.1116/1.4993724},
url = {https://doi.org/10.1116%2F1.4993724},
year = 2017,
month = {nov},
publisher = {American Vacuum Society},
volume = {35},
number = {6},
pages = {06G501},
author = {Corinna Kaspar and Jörg Butschke and Mathias Irmscher and Stephan Martens and Holger Sailer and Robert Kirchner and Vitaliy A. Guzenko and Helmut Schift and Joachim N. Burghartz},
title = {Adjustable sidewall slopes by electron-beam exposure layout},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}
doi = {10.1116/1.4993724},
url = {https://doi.org/10.1116%2F1.4993724},
year = 2017,
month = {nov},
publisher = {American Vacuum Society},
volume = {35},
number = {6},
pages = {06G501},
author = {Corinna Kaspar and Jörg Butschke and Mathias Irmscher and Stephan Martens and Holger Sailer and Robert Kirchner and Vitaliy A. Guzenko and Helmut Schift and Joachim N. Burghartz},
title = {Adjustable sidewall slopes by electron-beam exposure layout},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}
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