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Fabrication and characterization of sub-500nm channel organic field effect transistor using UV nanoimprint lithography with cheap Si-mold
Reference
Lichao Teng, Robert Kirchner, Matthias Plötner, Alexander Türke, Andreas Jahn, Jian He, Falk Hagemann, Wolf-Joachim Fischer, "Fabrication and characterization of sub-500nm channel organic field effect transistor using UV nanoimprint lithography with cheap Si-mold", In Microelectronic Engineering, Elsevier BV, vol. 97, pp. 38–42, Sep 2012. [doi]
Bibtex
@article{Teng_2012,
doi = {10.1016/j.mee.2012.04.004},
url = {https://doi.org/10.1016%2Fj.mee.2012.04.004},
year = 2012,
month = {sep},
publisher = {Elsevier {BV}},
volume = {97},
pages = {38--42},
author = {Lichao Teng and Robert Kirchner and Matthias Plötner and Alexander Türke and Andreas Jahn and Jian He and Falk Hagemann and Wolf-Joachim Fischer},
title = {Fabrication and characterization of sub-500nm channel organic field effect transistor using {UV} nanoimprint lithography with cheap Si-mold},
journal = {Microelectronic Engineering}
}
doi = {10.1016/j.mee.2012.04.004},
url = {https://doi.org/10.1016%2Fj.mee.2012.04.004},
year = 2012,
month = {sep},
publisher = {Elsevier {BV}},
volume = {97},
pages = {38--42},
author = {Lichao Teng and Robert Kirchner and Matthias Plötner and Alexander Türke and Andreas Jahn and Jian He and Falk Hagemann and Wolf-Joachim Fischer},
title = {Fabrication and characterization of sub-500nm channel organic field effect transistor using {UV} nanoimprint lithography with cheap Si-mold},
journal = {Microelectronic Engineering}
}
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