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High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning
Reference
Andreas Finn, Bo Lu, Robert Kirchner, Xaver Thrun, Karola Richter, Wolf-Joachim Fischer, "High aspect ratio pattern collapse of polymeric UV-nano-imprint molds due to cleaning", In Microelectronic Engineering, Elsevier BV, vol. 110, pp. 112–118, Oct 2013. [doi]
Bibtex
@article{Finn_2013,
doi = {10.1016/j.mee.2013.02.065},
url = {https://doi.org/10.1016%2Fj.mee.2013.02.065},
year = 2013,
month = {oct},
publisher = {Elsevier {BV}},
volume = {110},
pages = {112--118},
author = {Andreas Finn and Bo Lu and Robert Kirchner and Xaver Thrun and Karola Richter and Wolf-Joachim Fischer},
title = {High aspect ratio pattern collapse of polymeric {UV}-nano-imprint molds due to cleaning},
journal = {Microelectronic Engineering}
}
doi = {10.1016/j.mee.2013.02.065},
url = {https://doi.org/10.1016%2Fj.mee.2013.02.065},
year = 2013,
month = {oct},
publisher = {Elsevier {BV}},
volume = {110},
pages = {112--118},
author = {Andreas Finn and Bo Lu and Robert Kirchner and Xaver Thrun and Karola Richter and Wolf-Joachim Fischer},
title = {High aspect ratio pattern collapse of polymeric {UV}-nano-imprint molds due to cleaning},
journal = {Microelectronic Engineering}
}
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