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Comparative study of resists and lithographic tools using the Lumped Parameter Model
Reference
Roberto Fallica, Robert Kirchner, Yasin Ekinci, Dominique Mailly, "Comparative study of resists and lithographic tools using the Lumped Parameter Model", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 34, no. 6, pp. 06K702, Nov 2016. [doi]
Bibtex
@article{Fallica_2016,
doi = {10.1116/1.4967183},
url = {https://doi.org/10.1116%2F1.4967183},
year = 2016,
month = {nov},
publisher = {American Vacuum Society},
volume = {34},
number = {6},
pages = {06K702},
author = {Roberto Fallica and Robert Kirchner and Yasin Ekinci and Dominique Mailly},
title = {Comparative study of resists and lithographic tools using the Lumped Parameter Model},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}
doi = {10.1116/1.4967183},
url = {https://doi.org/10.1116%2F1.4967183},
year = 2016,
month = {nov},
publisher = {American Vacuum Society},
volume = {34},
number = {6},
pages = {06K702},
author = {Roberto Fallica and Robert Kirchner and Yasin Ekinci and Dominique Mailly},
title = {Comparative study of resists and lithographic tools using the Lumped Parameter Model},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}
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