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ZEP520A \textemdash A resist for electron-beam grayscale lithography and thermal reflow
Reference
R. Kirchner, V.A. Guzenko, I. Vartiainen, N. Chidambaram, H. Schift, "ZEP520A \textemdash A resist for electron-beam grayscale lithography and thermal reflow", In Microelectronic Engineering, Elsevier BV, vol. 153, pp. 71–76, Mar 2016. [doi]
Bibtex
@article{Kirchner_2016,
doi = {10.1016/j.mee.2016.01.017},
url = {https://doi.org/10.1016%2Fj.mee.2016.01.017},
year = 2016,
month = {mar},
publisher = {Elsevier {BV}},
volume = {153},
pages = {71--76},
author = {R. Kirchner and V.A. Guzenko and I. Vartiainen and N. Chidambaram and H. Schift},
title = {{ZEP}520A {\textemdash} A resist for electron-beam grayscale lithography and thermal reflow},
journal = {Microelectronic Engineering}
}
doi = {10.1016/j.mee.2016.01.017},
url = {https://doi.org/10.1016%2Fj.mee.2016.01.017},
year = 2016,
month = {mar},
publisher = {Elsevier {BV}},
volume = {153},
pages = {71--76},
author = {R. Kirchner and V.A. Guzenko and I. Vartiainen and N. Chidambaram and H. Schift},
title = {{ZEP}520A {\textemdash} A resist for electron-beam grayscale lithography and thermal reflow},
journal = {Microelectronic Engineering}
}
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