cfaed Publications
Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
Reference
Roberto Fallica, Dimitrios Kazazis, Robert Kirchner, Anja Voigt, Iacopo Mochi, Helmut Schift, Yasin Ekinci, "Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography", In Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, American Vacuum Society, vol. 35, no. 6, pp. 061603, Nov 2017. [doi]
Bibtex
@article{Fallica_2017,
doi = {10.1116/1.5003476},
url = {https://doi.org/10.1116%2F1.5003476},
year = 2017,
month = {nov},
publisher = {American Vacuum Society},
volume = {35},
number = {6},
pages = {061603},
author = {Roberto Fallica and Dimitrios Kazazis and Robert Kirchner and Anja Voigt and Iacopo Mochi and Helmut Schift and Yasin Ekinci},
title = {Lithographic performance of {ZEP}520A and mr-{PosEBR} resists exposed by electron beam and extreme ultraviolet lithography},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}
doi = {10.1116/1.5003476},
url = {https://doi.org/10.1116%2F1.5003476},
year = 2017,
month = {nov},
publisher = {American Vacuum Society},
volume = {35},
number = {6},
pages = {061603},
author = {Roberto Fallica and Dimitrios Kazazis and Robert Kirchner and Anja Voigt and Iacopo Mochi and Helmut Schift and Yasin Ekinci},
title = {Lithographic performance of {ZEP}520A and mr-{PosEBR} resists exposed by electron beam and extreme ultraviolet lithography},
journal = {Journal of Vacuum Science {\&} Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena}
}
Downloads
No Downloads available for this publication
Permalink
https://cfaed.tu-dresden.de/publications?pubId=3294