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Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum

Reference

Marcel Junige, Markus Löffler, Marion Geidel, Matthias Albert, Johann W Bartha, Ehrenfried Zschech, Bernd Rellinghaus, Willem F van Dorp, "Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2 substratum", In Nanotechnology, IOP Publishing, vol. 28, no. 39, pp. 395301, Sep 2017. [doi]

Bibtex

@article{Junige_2017,
doi = {10.1088/1361-6528/aa8844},
url = {https://doi.org/10.1088%2F1361-6528%2Faa8844},
year = 2017,
month = {sep},
publisher = {{IOP} Publishing},
volume = {28},
number = {39},
pages = {395301},
author = {Marcel Junige and Markus Löffler and Marion Geidel and Matthias Albert and Johann W Bartha and Ehrenfried Zschech and Bernd Rellinghaus and Willem F van Dorp},
title = {Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus {SiO}2 substratum},
journal = {Nanotechnology}
}

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