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Chemical vapor deposition of twisted bilayer and few-layer MoSe2 over SiO x substrates
Reference
A. Bachmatiuk, RF Abelin, HT Quang, B. Trzebicka, J. Eckert, Mark Hermann Rummeli, "Chemical vapor deposition of twisted bilayer and few-layer MoSe2 over SiO x substrates", In Nanotechnology, IOP Publishing, vol. 25, no. 36, pp. 365603, 2014.
Bibtex
@article{bachmatiuk2014chemical,
title={Chemical vapor deposition of twisted bilayer and few-layer MoSe2 over SiO x substrates},
author={Bachmatiuk, A and Abelin, RF and Quang, HT and Trzebicka, B and Eckert, J and Rummeli, Mark Hermann},
journal={Nanotechnology},
volume={25},
number={36},
pages={365603},
year={2014},
publisher={IOP Publishing}
}
title={Chemical vapor deposition of twisted bilayer and few-layer MoSe2 over SiO x substrates},
author={Bachmatiuk, A and Abelin, RF and Quang, HT and Trzebicka, B and Eckert, J and Rummeli, Mark Hermann},
journal={Nanotechnology},
volume={25},
number={36},
pages={365603},
year={2014},
publisher={IOP Publishing}
}
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