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A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition

Reference

Halit Altuntas, Turkan Bayrak, "A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition" , In Electronic Materials Letters, Springer, pp. 1–6.

Bibtex

@article{altuntascomparative,
title={A comparative study on electrical characteristics of crystalline AlN thin films deposited by ICP and HCPA-sourced atomic layer deposition},
author={Altuntas, Halit and Bayrak, Turkan},
journal={Electronic Materials Letters},
pages={1--6},
publisher={Springer}
}

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