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Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes—An alternative initial step
Reference
Anja Förster, Christian Wagner, Jörg Schuster, Joachim Friedrich, "Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes—An alternative initial step", In Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, AVS, vol. 35, no. 1, pp. 01B113, 2017.
Bibtex
@article{forster2017ab,
title={Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes—An alternative initial step},
author={F{\"o}rster, Anja and Wagner, Christian and Schuster, J{\"o}rg and Friedrich, Joachim},
journal={Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films},
volume={35},
number={1},
pages={01B113},
year={2017},
publisher={AVS}
}
title={Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes—An alternative initial step},
author={F{\"o}rster, Anja and Wagner, Christian and Schuster, J{\"o}rg and Friedrich, Joachim},
journal={Journal of Vacuum Science \& Technology A: Vacuum, Surfaces, and Films},
volume={35},
number={1},
pages={01B113},
year={2017},
publisher={AVS}
}
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