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Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition

Reference

Thomas Henke, Martin Knaut, Christoph Hossbach, Marion Geidel, Matthias Albert, Johann W Bartha, "Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition" , In Surface and Coatings Technology, Elsevier, vol. 309, pp. 600–608, 2017.

Bibtex

@article{henke2017growth,
title={Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition},
author={Henke, Thomas and Knaut, Martin and Hossbach, Christoph and Geidel, Marion and Albert, Matthias and Bartha, Johann W},
journal={Surface and Coatings Technology},
volume={309},
pages={600--608},
year={2017},
publisher={Elsevier}
}

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