cfaed Publications
Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition
Reference
Thomas Henke, Martin Knaut, Christoph Hossbach, Marion Geidel, Matthias Albert, Johann W Bartha, "Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition", In Surface and Coatings Technology, Elsevier, vol. 309, pp. 600–608, 2017.
Bibtex
@article{henke2017growth,
title={Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition},
author={Henke, Thomas and Knaut, Martin and Hossbach, Christoph and Geidel, Marion and Albert, Matthias and Bartha, Johann W},
journal={Surface and Coatings Technology},
volume={309},
pages={600--608},
year={2017},
publisher={Elsevier}
}
title={Growth of aluminum oxide thin films with enhanced film density by the integration of in situ flash annealing into low-temperature atomic layer deposition},
author={Henke, Thomas and Knaut, Martin and Hossbach, Christoph and Geidel, Marion and Albert, Matthias and Bartha, Johann W},
journal={Surface and Coatings Technology},
volume={309},
pages={600--608},
year={2017},
publisher={Elsevier}
}
Downloads
No Downloads available for this publication
Related Paths
Permalink
https://cfaed.tu-dresden.de/publications?pubId=1909