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Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties

Reference

Thomas Henke, Martin Knaut, Marion Geidel, Felix Winkler, Matthias Albert, Johann W Bartha, "Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties" , In Thin Solid Films, Elsevier, 2017.

Bibtex

@article{henke2017atomic,
title={Atomic layer deposition of tantalum oxide thin films using the precursor tert-butylimido-tris-ethylmethylamido-tantalum and water: Process characteristics and film properties},
author={Henke, Thomas and Knaut, Martin and Geidel, Marion and Winkler, Felix and Albert, Matthias and Bartha, Johann W},
journal={Thin Solid Films},
year={2017},
publisher={Elsevier}
}

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