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Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material

Reference

Uwe Schroeder, Claudia Richter, Min Hyuk Park, Tony Schenk, Milan Peši\ c, Michael Hoffmann, Franz P. G. Fengler, Darius Pohl, Bernd Rellinghaus, Chuanzhen Zhou, Ching-Chang Chung, Jacob L. Jones, Thomas Mikolajick, "Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material" , In Inorganic Chemistry, American Chemical Society (ACS), vol. 57, no. 5, pp. 2752–2765, Feb 2018. [doi]

Bibtex

@article{Schroeder_2018,
doi = {10.1021/acs.inorgchem.7b03149},
url = {https://doi.org/10.1021%2Facs.inorgchem.7b03149},
year = 2018,
month = {feb},
publisher = {American Chemical Society ({ACS})},
volume = {57},
number = {5},
pages = {2752--2765},
author = {Uwe Schroeder and Claudia Richter and Min Hyuk Park and Tony Schenk and Milan Pe{\v{s}}i{\'{c}} and Michael Hoffmann and Franz P. G. Fengler and Darius Pohl and Bernd Rellinghaus and Chuanzhen Zhou and Ching-Chang Chung and Jacob L. Jones and Thomas Mikolajick},
title = {Lanthanum-Doped Hafnium Oxide: A Robust Ferroelectric Material},
journal = {Inorganic Chemistry}
}

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