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Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes\textemdashAn alternative initial step
Reference
Anja Förster, Christian Wagner, Jörg Schuster, Joachim Friedrich, "Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes\textemdashAn alternative initial step", In Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, American Vacuum Society, vol. 35, no. 1, pp. 01B113, Jan 2017. [doi]
Bibtex
@article{F_rster_2017,
doi = {10.1116/1.4968196},
url = {https://doi.org/10.1116%2F1.4968196},
year = 2017,
month = {jan},
publisher = {American Vacuum Society},
volume = {35},
number = {1},
pages = {01B113},
author = {Anja Förster and Christian Wagner and Jörg Schuster and Joachim Friedrich},
title = {Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes{\textemdash}An alternative initial step},
journal = {Journal of Vacuum Science {\&} Technology A: Vacuum, Surfaces, and Films}
}
doi = {10.1116/1.4968196},
url = {https://doi.org/10.1116%2F1.4968196},
year = 2017,
month = {jan},
publisher = {American Vacuum Society},
volume = {35},
number = {1},
pages = {01B113},
author = {Anja Förster and Christian Wagner and Jörg Schuster and Joachim Friedrich},
title = {Ab initio study of the trimethylaluminum atomic layer deposition process on carbon nanotubes{\textemdash}An alternative initial step},
journal = {Journal of Vacuum Science {\&} Technology A: Vacuum, Surfaces, and Films}
}
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