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Chemical and Electronic Repair Mechanism of Defects in MoS2 Monolayers
Reference
Anja Förster, Sibylle Gemming, Gotthard Seifert, David Tománek, "Chemical and Electronic Repair Mechanism of Defects in MoS2 Monolayers", In ACS Nano, American Chemical Society (ACS), vol. 11, no. 10, pp. 9989–9996, Sep 2017. [doi]
Bibtex
@article{F_rster_2017,
doi = {10.1021/acsnano.7b04162},
url = {https://doi.org/10.1021%2Facsnano.7b04162},
year = 2017,
month = {sep},
publisher = {American Chemical Society ({ACS})},
volume = {11},
number = {10},
pages = {9989--9996},
author = {Anja Förster and Sibylle Gemming and Gotthard Seifert and David Tom{\'{a}}nek},
title = {Chemical and Electronic Repair Mechanism of Defects in {MoS}2 Monolayers},
journal = {{ACS} Nano}
}
doi = {10.1021/acsnano.7b04162},
url = {https://doi.org/10.1021%2Facsnano.7b04162},
year = 2017,
month = {sep},
publisher = {American Chemical Society ({ACS})},
volume = {11},
number = {10},
pages = {9989--9996},
author = {Anja Förster and Sibylle Gemming and Gotthard Seifert and David Tom{\'{a}}nek},
title = {Chemical and Electronic Repair Mechanism of Defects in {MoS}2 Monolayers},
journal = {{ACS} Nano}
}
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