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In-situ Growth Control für AlxTiyOz Films and Laminates
Reference
M. Knaut, F. Benner, C. Hoßbach, M. Geidel, I. Dirnstorfer, M. Albert, J.W. Bartha, "In-situ Growth Control für AlxTiyOz Films and Laminates", 2013.
Bibtex
@conference{aufsatz52993,
affiliation={Professur für Halbleitertechnik},
title={In-situ Growth Control für AlxTiyOz Films and Laminates},
journal={13th AVS conference on Atomic Layer Deposition, San Diego, CA, USA, 28.07.-31.07.2013},
keywords={ALD, QCM, SE, XPS, in-situ, Al2O3, TiO2, film growth, process integration},
year={2013},
peerreview={Nein},
openaccess={Nein},
author={Knaut, M. and Benner, F. and Hoßbach, C. and Geidel, M. and Dirnstorfer, I. and Albert, M. and Bartha, J.W.}
}
affiliation={Professur für Halbleitertechnik},
title={In-situ Growth Control für AlxTiyOz Films and Laminates},
journal={13th AVS conference on Atomic Layer Deposition, San Diego, CA, USA, 28.07.-31.07.2013},
keywords={ALD, QCM, SE, XPS, in-situ, Al2O3, TiO2, film growth, process integration},
year={2013},
peerreview={Nein},
openaccess={Nein},
author={Knaut, M. and Benner, F. and Hoßbach, C. and Geidel, M. and Dirnstorfer, I. and Albert, M. and Bartha, J.W.}
}
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