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Multi-scale radiographic applications in microelectronic industry
Reference
J. Gluch, M. Löffler, N. Meyendorf, M. Oppermann, M. Röllig, P. Sättler, K. J. Wolter, E. Zschech, "Multi-scale radiographic applications in microelectronic industry", AIP Publishing LLC, 2016. [doi]
Bibtex
@inproceedings{Gluch_2016,
doi = {10.1063/1.4940472},
url = {https://doi.org/10.1063%2F1.4940472},
year = 2016,
publisher = {{AIP} Publishing {LLC}},
author = {J. Gluch and M. Löffler and N. Meyendorf and M. Oppermann and M. Röllig and P. Sättler and K. J. Wolter and E. Zschech},
title = {Multi-scale radiographic applications in microelectronic industry}
}
doi = {10.1063/1.4940472},
url = {https://doi.org/10.1063%2F1.4940472},
year = 2016,
publisher = {{AIP} Publishing {LLC}},
author = {J. Gluch and M. Löffler and N. Meyendorf and M. Oppermann and M. Röllig and P. Sättler and K. J. Wolter and E. Zschech},
title = {Multi-scale radiographic applications in microelectronic industry}
}
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