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Electronic Doping and Enhancement of n-Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilanes
Reference
Nara Shin, Karl Sebastian Schellhammer, Min Ho Lee, Jakob Zessin, Mike Hambsch, Alberto Salleo, Frank Ortmann, Stefan C. B. Mannsfeld, "Electronic Doping and Enhancement of n-Channel Polycrystalline OFET Performance through Gate Oxide Modifications with Aminosilanes", In Advanced Materials Interfaces, Wiley, pp. 2100320, Jul 2021. [doi]
Bibtex
@article{Shin_2021,
doi = {10.1002/admi.202100320},
url = {https://doi.org/10.1002%2Fadmi.202100320},
year = 2021,
month = {jul},
publisher = {Wiley},
pages = {2100320},
author = {Nara Shin and Karl Sebastian Schellhammer and Min Ho Lee and Jakob Zessin and Mike Hambsch and Alberto Salleo and Frank Ortmann and Stefan C. B. Mannsfeld},
title = {Electronic Doping and Enhancement of n-Channel Polycrystalline {OFET} Performance through Gate Oxide Modifications with Aminosilanes},
journal = {Advanced Materials Interfaces}
}
doi = {10.1002/admi.202100320},
url = {https://doi.org/10.1002%2Fadmi.202100320},
year = 2021,
month = {jul},
publisher = {Wiley},
pages = {2100320},
author = {Nara Shin and Karl Sebastian Schellhammer and Min Ho Lee and Jakob Zessin and Mike Hambsch and Alberto Salleo and Frank Ortmann and Stefan C. B. Mannsfeld},
title = {Electronic Doping and Enhancement of n-Channel Polycrystalline {OFET} Performance through Gate Oxide Modifications with Aminosilanes},
journal = {Advanced Materials Interfaces}
}
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