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A simple lithography-free approach for the fabrication of top-contact OFETs with sub-micrometer channel length
Reference
Katherina Haase, Felix Talnack, Shabnam Donnhäuser, Alexander Tahn, Markus Löffler, Mike Hambsch, Stefan C.B. Mannsfeld, "A simple lithography-free approach for the fabrication of top-contact OFETs with sub-micrometer channel length", In Organic Electronics, Elsevier BV, vol. 119, pp. 106819, Aug 2023. [doi]
Bibtex
@article{Haase_2023,
doi = {10.1016/j.orgel.2023.106819},
url = {https://doi.org/10.1016%2Fj.orgel.2023.106819},
year = 2023,
month = {aug},
publisher = {Elsevier {BV}},
volume = {119},
pages = {106819},
author = {Katherina Haase and Felix Talnack and Shabnam Donnhäuser and Alexander Tahn and Markus Löffler and Mike Hambsch and Stefan C.B. Mannsfeld},
title = {A simple lithography-free approach for the fabrication of top-contact {OFETs} with sub-micrometer channel length},
journal = {Organic Electronics}
}
doi = {10.1016/j.orgel.2023.106819},
url = {https://doi.org/10.1016%2Fj.orgel.2023.106819},
year = 2023,
month = {aug},
publisher = {Elsevier {BV}},
volume = {119},
pages = {106819},
author = {Katherina Haase and Felix Talnack and Shabnam Donnhäuser and Alexander Tahn and Markus Löffler and Mike Hambsch and Stefan C.B. Mannsfeld},
title = {A simple lithography-free approach for the fabrication of top-contact {OFETs} with sub-micrometer channel length},
journal = {Organic Electronics}
}
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