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A New In Situ Microscopy Approach to Study the Degradation and Failure Mechanisms of Time-Dependent Dielectric Breakdown: Set-Up and Opportunities

Reference

Zhongquan Liao, Martin Gall, Kong Boon Yeap, Christoph Sander, Oliver Aubel, Uwe Mühle, Jürgen Gluch, Sven Niese, Yvonne Standke, Rüdiger Rosenkranz, others, "A New In Situ Microscopy Approach to Study the Degradation and Failure Mechanisms of Time-Dependent Dielectric Breakdown: Set-Up and Opportunities" , In Advanced Engineering Materials, Wiley Online Library, vol. 16, no. 5, pp. 486–493, 2014.

Bibtex

@article{liao2014new,
title={A New In Situ Microscopy Approach to Study the Degradation and Failure Mechanisms of Time-Dependent Dielectric Breakdown: Set-Up and Opportunities},
author={Liao, Zhongquan and Gall, Martin and Yeap, Kong Boon and Sander, Christoph and Aubel, Oliver and M{\"u}hle, Uwe and Gluch, J{\"u}rgen and Niese, Sven and Standke, Yvonne and Rosenkranz, R{\"u}diger and others},
journal={Advanced Engineering Materials},
volume={16},
number={5},
pages={486--493},
year={2014},
publisher={Wiley Online Library}
}

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