cfaed Publications

Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation

Reference

Anja Förster, Christian Wagner, Sibylle Gemming, Jörg Schuster, "Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation" , In Journal of Vacuum Science & Technology B, AVS: Science & Technology of Materials, Interfaces, and Processing, vol. 33, no. 5, pp. 052203, 2015.

Bibtex

@article{forster2015theoretical,
title={Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation},
author={F{\"o}rster, Anja and Wagner, Christian and Gemming, Sibylle and Schuster, J{\"o}rg},
journal={Journal of Vacuum Science \& Technology B},
volume={33},
number={5},
pages={052203},
year={2015},
publisher={AVS: Science \& Technology of Materials, Interfaces, and Processing}
}

Downloads

No Downloads available for this publication

Related Paths

Silicon Nanowire Path

Permalink

https://cfaed.tu-dresden.de/publications?pubId=696


Go back to publications list