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Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation
Reference
Anja Förster, Christian Wagner, Sibylle Gemming, Jörg Schuster, "Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation", In Journal of Vacuum Science & Technology B, AVS: Science & Technology of Materials, Interfaces, and Processing, vol. 33, no. 5, pp. 052203, 2015.
Bibtex
@article{forster2015theoretical,
title={Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation},
author={F{\"o}rster, Anja and Wagner, Christian and Gemming, Sibylle and Schuster, J{\"o}rg},
journal={Journal of Vacuum Science \& Technology B},
volume={33},
number={5},
pages={052203},
year={2015},
publisher={AVS: Science \& Technology of Materials, Interfaces, and Processing}
}
title={Theoretical investigation of an in situ k-restore process for damaged ultra-low-k materials based on plasma enhanced fragmentation},
author={F{\"o}rster, Anja and Wagner, Christian and Gemming, Sibylle and Schuster, J{\"o}rg},
journal={Journal of Vacuum Science \& Technology B},
volume={33},
number={5},
pages={052203},
year={2015},
publisher={AVS: Science \& Technology of Materials, Interfaces, and Processing}
}
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