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Si amorphization by focused ion beam milling: Point defect model with dynamic BCA simulation and experimental validation
Reference
J. Huang, M. Löffler, U. Mühle, W. Moeller, J.J.L. Mulders, L.F.Tz. Kwakman, W.F. Van Dorp, E. Zschech, "Si amorphization by focused ion beam milling: Point defect model with dynamic BCA simulation and experimental validation" , In Ultramicroscopy, Elsevier BV, vol. 184, pp. 52–56, Jan 2018. [doi]
Bibtex
@article{Huang_Löffler_Mühle_Moeller_Mulders_Kwakman_Van Dorp_Zschech_2018,
doi = {10.1016/j.ultramic.2017.10.011},
url = {http://dx.doi.org/10.1016/j.ultramic.2017.10.011},
year = {2018},
publisher={Elsevier BV},
author = {Huang, J. and Löffler, M. and Mühle, U. and Moeller, W. and Mulders, J.J.L. and Kwakman, L.F.Tz. and Van Dorp, W.F. and Zschech, E.},
title={Si amorphization by focused ion beam milling: Point defect model with dynamic BCA simulation and experimental validation},
journal = {Ultramicroscopy},
volume = {184},
month = {Jan},
pages = {52–56}
}
doi = {10.1016/j.ultramic.2017.10.011},
url = {http://dx.doi.org/10.1016/j.ultramic.2017.10.011},
year = {2018},
publisher={Elsevier BV},
author = {Huang, J. and Löffler, M. and Mühle, U. and Moeller, W. and Mulders, J.J.L. and Kwakman, L.F.Tz. and Van Dorp, W.F. and Zschech, E.},
title={Si amorphization by focused ion beam milling: Point defect model with dynamic BCA simulation and experimental validation},
journal = {Ultramicroscopy},
volume = {184},
month = {Jan},
pages = {52–56}
}
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